@article {12_IEEEMWCL_Leal-SevillanoMontejo-GaraiMaolongEtAl_Pseudo-EllipticalResponseFilterSU8,
	title = {A Pseudo-Elliptical Response Filter at W-Band Fabricated with Thick SU-8 Photo-Resist Technology},
	journal = {IEEE Microwave and Wireless Components Letters},
	volume = {22},
	number = {3},
	year = {2012},
	month = {March},
	pages = {105-107},
	abstract = {The design and experimental validation of a pseudo-elliptical response filter at W-Band is presented. A micromachining technique based on the thick SU-8 photo-resist is used to construct the filter. The optimized structure is specially well-suited for the implementation of filters with transmission zeros by means of micromachining techniques, since the extracted poles are implemented by simple stubs without irises. Furthermore, a novel topology based on the use of only three SU-8 layers is presented. This new topology, which includes a novel optimized input/output routing, can be potentially used for the design of high-performance devices with a fast and low-cost production. A fourth-order filter with two transmission zeros has been fabricated (bandwidth 5\%), presenting 1.2 dB of insertion loss. This level of loss is equivalent to the actual state-of-art for micromachined filters at W-band, in spite of the reduced height and the split block in the H-plane used in the presented design.},
	issn = {1531-1309},
	doi = {http://dx.doi.org/10.1109/LMWC.2012.2183861},
	url = {http://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=\&arnumber=6157647\&contentType=Journals+\%26+Magazines\&sortType\%3Dasc_p_Sequence\%26filter\%3DAND\%28p_IS_Number\%3A6166715\%29},
	author = {C A Leal-Sevillano and Montejo-Garai, J R and Ke Maolong and Lancaster, M. J and J A Ruiz-Cruz and Rebollar, J M}
}
