| Título | A Pseudo-Elliptical Response Filter at W-Band Fabricated with Thick SU-8 Photo-Resist Technology |
| Tipo de publicación | Journal Article |
| Year of Publication | 2012 |
| Autores | Leal-Sevillano, C. A., J. R. Montejo-Garai, K. Maolong, M.. J. Lancaster, J. A. Ruiz-Cruz, and J. M. Rebollar |
| Journal | IEEE Microwave and Wireless Components Letters |
| Volumen | 22 |
| Pagination | 105-107 |
| Date Published | March |
| ISSN | 1531-1309 |
| Resumen | The design and experimental validation of a pseudo-elliptical response filter at W-Band is presented. A micromachining technique based on the thick SU-8 photo-resist is used to construct the filter. The optimized structure is specially well-suited for the implementation of filters with transmission zeros by means of micromachining techniques, since the extracted poles are implemented by simple stubs without irises. Furthermore, a novel topology based on the use of only three SU-8 layers is presented. This new topology, which includes a novel optimized input/output routing, can be potentially used for the design of high-performance devices with a fast and low-cost production. A fourth-order filter with two transmission zeros has been fabricated (bandwidth 5%), presenting 1.2 dB of insertion loss. This level of loss is equivalent to the actual state-of-art for micromachined filters at W-band, in spite of the reduced height and the split block in the H-plane used in the presented design. |
| URL | http://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=6157647&contentType=Journals+%26+Magazines&sortType%3Dasc_p_Sequence%26filter%3DAND%28p_IS_Number%3A6166715%29 |
| DOI | 10.1109/LMWC.2012.2183861 |
